Library Subscription: Guest

ISSN Online: 2377-424X

ISBN CD: 1-56700-226-9

ISBN Online: 1-56700-225-0

International Heat Transfer Conference 13
August, 13-18, 2006, Sydney, Australia

STUDY OF FLOW STRUCTURE RELATING TO THE HEAT AND MASS TRANSFER IN MICRO LIQUID FILMS IN MARANGONI DRYING PROCESSES OF SILICON WAFER

Get access (open in a dialog) DOI: 10.1615/IHTC13.p12.330
10 pages

Abstract

The solid/liquid/gas interface, the so called three-phase contact line, appears in liquid system with free surface accompanying the gas adsorption and dissolution. This is the case of the cleansing and drying processes of silicon wafer in the semiconductor manufacturing industries. Marangoni flow to be generated due to non-uniform distribution of dissolved gas concentration is an important technical issue in that case. This article pays attention to the drawing-up system of wafer from ultra pure water doped with IPA (isopropyl alcohol) and studies what phenomena occurs near the three-phase contact line, if the cleansing and drying processes are enhanced and if they are affected by the surface wettability. IPA concentration was confirmed to distribute non-uniformly along the vertical direction parallel to the wafer drawing-up motion and Marangoni flow should be generated. Three-phase contact line was observed to be seriously deformed from straight line into a wavy one. The micro liquid film then comes to have a pleats-like wavy shape which is judged to be a kind of solitary wave propagating in the direction along the three-phase contact line. Propagation of wave also accompanies the peristalsis motion of wavy contact line. These motions are related to the observed fluctuations of concentration and temperature. Wave propagation speed is more than ten times larger than the silicon wafer drawing-up speed. Therefore three dimensional dynamic flow structures exist and should affect the heat and mass transfer there. There effects on drying and cleansing are also studied.