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International Heat Transfer Conference 16

ISSN: 2377-424X (online)
ISSN: 2377-4371 (flashdrive)

EXPERIMENTAL STUDY ON EVAPORATION CHARACTERISTICS OF MENISCUS

Shu Soma
Kyoto University, Kyoto-Daigaku katsura, Nishikyo-ku, Kyoto, 615-8540, Japan

Tomoaki Kunugi
Department of Nuclear Engineering, Kyoto University, Kyoto Daigaku-Katsura, Nishikyo-ku, Kyoto, Japan

Takehiko Yokomine
Advanced Energy Engineering Science, Interdisciplinary Graduate School of Engineering Science, Kyushu University, Kasuga-kouen 6-1, Kasuga, Fukuoka 816-8580, JAPAN; Department of Nuclear Engineering, Kyoto University, Kyoto-Daigaku Kastura, Nishikyo-Ku, Kyoto, 615-8540 Japan

Zensaku Kawara
Department of Nuclear Engineering, Kyoto University, Kyoto-Daigaku katsura, Nishikyo-ku, Kyoto, 615-8540, Japan

DOI: 10.1615/IHTC16.bae.022238
pages 1069-1076


KEY WORDS: Boiling and evaporation, Measurement and instrumentation, Meniscus, Curvature, Capillary Length, Evaporation Rate

Abstract

In the previous experiments to study the dependence of the geometrical gap configuration on the evaporation characteristics, the range of the parameters such as the perimeter and the curvature of meniscus are very limited to discuss the entire physics of the evaporation in the confined geometry. We performed the experiments for measuring the evaporation quantities of water such as the evaporation rates, meniscus shapes and temperatures in the various gap configurations to vary the perimeter and the curvature widely. To measure the contact angle of the evaporating meniscus, the laser interference technique which has been used for visualizing the liquid film under the nucleate boiling bubble was used. The results show that the evaporation rate strongly depends on the meniscus curvature rather than the perimeter, if the characteristic length of the gap configuration is smaller than the capillary length. The temperature data measured by a miniature thermocouple with simultaneously measuring the evaporation rate showed evaporation made the temperature in the meniscus lower than the temperature at the outer surface of the solid substrate.

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